Vacuum Technology and Coating - 2015 September Product Showcases

Deposition and Evaporation Sources & Materials

Terrence Thompson 2015-09-16 02:05:35

Product Descriptions This product showcase includes sputtering targets, evaporation sources, ion sources, cathodes, coatings and other materials and bonding services used for various deposition and coating applications.

Physical Vapor Deposition Materials for the Research Community ACI ALLOYS specializes in physical vapor deposition materials for the research community. We arc-cast an enormous variety of PVD materials in our own melters and we can also hot-press most non-metallics. We have a full machine shop and can make most foils and wires in our mills. Our sputtering targets and evaporation materials are made from high-purity elemental metals. Because we specialize in the R&D market, we can quote the lowest prices and fastest deliveries for smaller orders. Our staff of highly experienced metallurgists can make many materials other companies won’t.

ACI Alloys San Jose, CA www.acialloys.com Tel: 1-408-259-7337 E-mail: sales@acialloys.com or larry@acialloys.com

ITO Sputtering Target ANP has developed a high quality ITO target for its typical applications of ITO-coated substrates include electrodes for flat panel displays, touch panel contacts, energy saving, automobile windows, optoelectronic devices and solar panels, etc. ANP also manufacturers transparent conductive oxide (TCO) targets and IR-cut coating materials. ANP specializes in sintered metal oxide sputtering targets for PVD applications including ITO, IGZO, AZO, ZnO and other special TCO targets.

Advanced Nano Products Co. Ltd. (ANP) Sejong, Korea www.anapro.com Tel: +82-43-275-6966 Ext. 2 E-mail: webadmin@anapro.com

High Performance AZO and Other Targets As one of the earliest companies producing sputtering targets for producing solar energy cells in China, AT&M also is a supplier of related targets. Based on professional technology of ceramic materials over 50 years, AT&M has developed high performance AZO target which has the character of high purity, high density, homogeneous composition, low impedance and big size, etc. AT&M offers Cr, TiAl, NiCr, Mo, AZO, etc. targets using powder and metallurgy methods for hard coating, low- E glass, and PV cells. AT&M owns the largest HIP center and vacuum melting capacity in China and is ISO9001, ISO14001 and OHSAS18001 certified. Its strict quality control system enables AT&M to enjoy a high reputation in the international market. AT&M focuses its business on R&D and manufacture of new metallic materials and products.

Advanced Technology & Materials Co., Ltd. Beijing, China www.atmcn.com Tel: 86-10-6218 0969 6218 8403 E-mail: webmaster@atmcn.com

Axial & Radial Magnetron Turret Sources in UHV/HV Versions, Indexable 1" to 6" AJA International, Inc. has developed numerous indexable (1" to 6"), magnetron turret sources. These are available in both axial and radial configurations. Turret sources are ideal in systems where the complexity of the substrate holder is so extensive that it does not lend itself to articulation within the vacuum chamber. Alternately, the turret source brings the individual cathode heads to the substrate. The turret body can house switch boxes, an RF matchbox or both. Stepper motor controlled positioning hardware and software are fully developed and available. For additional information please contact AJA International, Inc. at 1-781- 545-7365, topgun@ajaint.com or via www.ajaint.com.

Super A315-XP Magnetron Sputter Sources for UHV/Compact 4.5 mm (0.19") AJA International, Inc. has developed a new, compact, 1.5"UHV magnetron for smaller substrate depositions. The compact size allows for the clustering of up to 13 sources in a confocal configuration for highly uniform depositions over substrates up to 3" diameter. These Super A315- XP Magnetron Sputter Sources are for UHV/ Compact 4.5 mm (0.19") thick standard targets and magnetic material compatibility. This is ideal for spintronics applications as the sources are also compatible with the sputtering of magnetic materials. The sources can be run with RF, DC and Pulsed DC power and are available as cluster flanges or as individual sources. The compact yet powerful design makes them ideal for nanocluster deposition equipment. For additional information please contact AJA International, Inc. at 1-781-545- 7365, topgun@ajaint.com or via www.ajaint.com.

Sputtering Targets & Deposition Materials, Affordable Prices, Guaranteed Purity AJA International, Inc., a world’s leading manufacturer of affordable premium R&D thin-film coating systems, offers a wide variety of deposition materials and sputtering targets with guaranteed purity. Unlike other target and materials manufacturers and resellers, AJA International, Inc. does not operate this part of its business as a profit center. Our primary objective is to maintain very close contact with our equipment customers and to attract new equipment customers while consistently operating this part of the business at a break-even level. As a result, end users are able to purchase the highest quality materials at very affordable prices with an assurance that the materials configuration is ideally suited for the coating equipment being used. For additional information please contact AJA International, Inc. at 1-781-545-7365, topgun@ajaint.com or via www.ajaint.com.

AJA International, Inc. North Scituate, MA www.ajaint.com Tel: 1-781-545-7365 E-mail: topgun@ajaint.com

High Purity Inorganic Materials and Sputtering Targets Alfa Aesar, a Johnson Matthey Company has over 1,200 high purity inorganic materials, including base metal compounds, rare earth compounds and ultra dry materials for air and moisture sensitive applications including sputtering targets. This includes Puratronic high purity base metal salts, which are the leading choice of pharmaceutical and electronic companies as the basic building blocks for many manufacturing processes. Additionally, the catalog lists the REacton brand line of high purity rare earth compounds, as well as Alfa Aesar’s comprehensive line of ultra dry anhydrous materials. Alfa Aesar high purity inorganics are used as starting materials in many applications, including crystal growth, lasers, optics, coating and deposition, and lighting. With global production and distribution plants, including a high purity inorganics facility in Royston, England and a custom manufacturing facility in Yantai, China, Alfa Aesar can produce a wide variety of products to meet the requirements of customers in a variety of industries. For the sampling stage, Alfa Aesar’s catalog distribution centers offer thousands of inorganic materials, pre-packed in various sizes and ready for immediate shipment. In addition, products are stocked in semi-bulk or bulk quantities to meet the increasing demand for quick turn around of pilot- and production-scale units.

Alfa Aesar, A Johnson Matthey Company Ward Hill, MA www.alfa.com Tel: 1-978-521-6300 E-mail: info@alfa.com

Precious Metals and Platinum Group Sputtering Targets American Elements produces high-purity precious and platinum group metals—gold, silver, platinum, iridium, osmium, ruthenium, rhodium, and palladium—in a variety of bulk forms and as sputtering targets, and as nanoparticles, and in compound forms such as oxides, chlorides and organometallics. We produce gold and silver nanoparticles in solution for use as conductive ink in printed electronics, and various formulations of precious metal conductor pastes. The platinum group metals are highly valued as catalysts and are frequently used to produce extremely hard, corrosion-resistant coatings on objects made from other metals. Palladium, platinum, gold, and silver all play important roles in high performance electronic and optical devices, serving as conductive plating materials and solder, wiring, electrodes, and reflective coatings.

Scandium Metal Sputtering Targets American Elements manufactures sputtering targets, pellets, rods, and powders, as well as high-quality organometallics, scandium oxide, scandium nitride, and other scandium compounds, for use in physical and chemical vapor deposition. Additionally, alloys of scandium with metals such as aluminum, zirconium, and nickel are available in many forms appropriate for deposition applications. Scandium metal is a key component of many strong, lightweight, and heat-resistant alloys, while many of its compounds such as lead scandium tantalate are technical ceramic materials that are frequently used in electronics and optical devices.

American Elements Los Angeles, CA www.americanelements.com Tel: 1-310-208-0551 E-mail: customerservice@americanelements.com

PVD Materials and Sputtering Targets In addition to a complete line of magnetrons and custom development services, Angstrom Sciences also offers a comprehensive selection of high-purity vacuum deposition materials. Sputtering targets vary from standard, single element materials to custom compounds. Angstrom Sciences supplies the broadest range of targets for your sputtering application. This includes all precious metals, pure metals, alloys, cermets, borides, oxides, nitrides, silicides, and fluorides. We utilize a variety of specialized processing techniques such as hot pressing, hot-isostatic pressing, induction vacuum melting, and vacuum casting to produce homogenous, fine-grained, high-density materials that conform to the strictest application standards. Angstrom Sciences is an original equipment manufacturer (OEM) specializing in the design, engineering and production of magnetron sputtering cathodes and PVD materials (including sputtering targets, backing plates and metallic bonding services). We provide a clamped gold (Au) target on a MRC magnetron modified to use a clamped target, rather than a bonded target. The modification to a clamped target design makes it easier to change targets in the lab for an expensive target material. We also provide non-bonded AZO (ZnO/Al2O3 98/2 wt%) target rings on a stainless steel backing tube for an onyx-6 × 61 cylindrical magnetron. The non-bonded design allows the user to change AZO Target Rings in the lab, rather than sending the assembly out for an expensive metallic bond.

Angstrom Sciences, Inc. Duquesne, PA www.angstromsciences.com Tel: 1-412-469-8466 E-mail: info@angstromsciences.com

Electron Beam Gun Source Combinations CHA’s SmartSource Electron Beam Gun combined with CHA’s unique thermal Swing Source addresses applications from university and R&D to multilayer thin film processing, including GaAs devices to optical coating. Available in 4-, 6- and 8-pocket configurations, the SmartSource uses a permanent magnet with a superimposed field that is varied by applying current to electromagnetic coils that provide longitudinal and lateral sweep. The Swing Source ensures deposition from the centerline of the chamber.

CHA Industries Fremont, CA www.chaindustries.com Tel: 1-510-683-8554 E-mail: sales@chaindustries.com

Ceramic Coatings CoorsTek Crewe (formerly Dynamic-Ceramic) realizes that producing solid ceramic components is not always the best approach to solving wear or corrosion problems. In some cases, taking the original metallic part and applying a ceramic coating can be the best solution. Ceramic coatings can vary from a few to several hundred microns and be deposited by different means. The ceramic coating, its thickness and means of deposition will depend on the final use of the components and the environment it has to resist. Coatings may be applied by many different techniques with coating thickness’ varying from several microns to several millimeters. Thin coatings are usually applied by PVD, CVD and Chemically Formed Processes (CFP) with other techniques, e.g. High Velocity Oxy-Fuel (HVOF), plasma and flame spraying together with Plasma Transferred Arc (PTA), weld over-laying and laser cladding, being used to deposit thicker coatings. We have a wide range of ceramic coatings that will work with appropriate deposition processes.

CoorsTek Crewe Crewe, England www.dynacer.com Tel: +44 (0) 1270 501000 E-mail: enquiries@dynacer.com or info_crewe@coorstek.com

Sputtering Targets and E-Beam Sources DHF Technical Products is dedicated to manufacturing technical products and providing services for sputtering targets, e-beam sources, medical implant device materials, R & D, thermocouple wire, electronic probes, or any other high tech application requiring precious metals. We manufacture targets, evaporation materials, e-beam sources and metals for plasma spray. We also provide bonding plates, backing plates, masks and shields, and offer refining & reclaiming services. We are one of the most trusted names in precious metal manufacturing and refining is now a trusted name in the thin film industry. For nearly four decades, our parent company, David H. Fell & Company, has supplied thousands of customers with precious metals products and services.

DHF Technical Targets Rio Rancho, NM www.dhftargets.com Contact: Marcel Anaya, Vice President Sales Tel: 1-505-994-0010 E-mail: marcel@dhftargets.com

Electron Beam Sources EB Sources listened to customers of CHA, TfiTelemark and Temescal electron beam source systems and designed replacement parts to meet exceed OEM specifications. Our parts are tested with our in-house system to ensure quality fit and function. We also manufacture replacement and new electron beam parts for the CHA Mark 50 evaporator. Our e-gun parts are designed to meet or exceed CHA Mark 50 specifications. We offer quick turn around and support for your custom applications. EB Sources strives to provide you with the very latest in technology paired with innovative design to minimize down times and maximize production. Our products are manufactured in the USA to last for years to come while providing cost savings. We also manufacture standard & custom sources, feedthroughs, coils, crucibles, emitters and other custom parts you need. We specialize in e-gun repair and magnet regaussing. We have a fast repair turn-around time with competitive pricing.

EB Sources Concord, CA www.ebsources.com Tel: 1-925 682-4420 E-mail: larry@ebsources.com

Patinal Evaporation Water- and Oil-Repellent Materials for Displays The Patinal evaporation materials from EMD Chemicals have consistently withstood the test of time and of stringent quality control of customers. The more than 40 evaporation materials, including special mixtures and substances, as well as fluorides, oxides, sulphides and metals available as granules, tablets, or disks, produce the highest quality of optical thin films with Physical Vapor Deposition, the method of choice in many coating applications. Ask for our industry leading HfO2 material. Patinal coated smart phones and tablet PCs with touch sensitive screens are part of our daily life. Only a screen without fingerprints allows unadulterated multimedia enjoyment. The readability of touch panels rapidly degrades when fingerprints accumulate on the surface. Apart from the less attractive appearance this reduces the usability of the equipment. EMD Chemicals Photonics has developed sophisticated materials that reduce the adherence of dirt and fingerprints on surfaces. Displays can be cleaned more quickly and the reduced surface friction makes them less sensitive to scratching. The smooth touch sensitive surface guarantees outstanding ease of operation. No need for protective films.

EMD Millipore/Merck KGaA Darmstadt, Germany www.emd-performance-materials.com Contact: Nina Diergardt Tel: +49 6151 72-7589 E-mail: pm_communications@emdgroup.com

6MHz/5MHz Quality Crystals—Gold, Longer Life Gold, Stress Relieving Alloy, Advanced Adhesion Alloy Fil-Tech, Inc. manufactures 6MHz and 5MHz Quality Crystals in Gold, Longer Life Gold, Stress Relieving Alloy, and Advanced Adhesion Alloy. Gold offers low contact resistance and high chemical stability. Stress Relieving Alloy crystals dissipate stresses from deposited dielectric materials to offer longer, jump free oscillation. Fil-Tech manufactures a complete line of sensorhead hardware including single and dual feedthroughs on 1" bolts or 2-3/4" flanges, single and dual sensorheads, and sputter heads and thin film thickness rate monitors. Fil-Tech supplies parts for Temescal and Telemark electron beam guns, including filaments, insulators, beam formers, anodes, electromagnetic coils, and OFHC copper crucibles and covers. Fil-Tech supplies graphite, molybdenum and titanium crucible liners. Fil-Tech supplies replacement parts for Commonwealth and Ion Tech Ion Sources, including filaments, insulators, gas distributors in graphite, stainless steel and titanium, anodes, and cathode tips. Fil-Tech supplies all Mark I and II ion source parts. Call 1-800-743-1743 or visit our NEW WEBSITE at www.filtech.com for savings with stock deliveries.

Fil-Tech, Inc. Boston, MA www.filtech.com Contact: Paula Becker Tel: 1-617-227-1133 or toll free 1-800-743-1743 E-mail: paula@filtech.com

Rectangular Magnetrons Gencoa manufacture the widest range of rectangular magnetrons available on the market for both internal and external mounting. There is an unrivaled range of magnetic options created to offer the optimum solution for different process requirements. Parametric 3D CAD design enables the efficient production of standard sizes within eight weeks. Gencoa can also create highly customized products tuned to your requirements. High yield magnetics are the most commonly produced magnetic type and are recommended for most applications where increased machine up-time or reduced material costs are required. Where high yield magnetics are utilized, a target use of 35-55% is achieved depending upon the nature of target and power mode. The unique Gencoa planar magnetron mechanical design offers various technical advantages that result in many cost savings from reduced tool downtimes and extended operating lifetimes.

Gencoa Circular Full Face Erosion Magnetrons The range of Gencoa circular full face erosion (FFE) magnetrons combine ultra-uniform films with a clean target erosion through scanning of the plasma over the target surface. The rotating magnetic system developed by Gencoa has the ability to tune the uniformity by adjusting the speed of rotation. This adaptive technique allows for corrections in uniformity when different materials or processes are used, or during changes to the target erosion. For example, the 14" SW350FFE source can hold uniformities below 1% on a 200mm wafer through target life and for different materials. Different mounting styles are available for FFE magnetrons. Now FFE type magnetrons are available from 4" up to 18" target diameters.

Gencoa Ltd. Liverpool, UK www.gencoa.com Tel: +44-0151-486-4466 E-mail: sales@gencoa.com or frank.papa@gencoa.com

Large Area PECVD Target for Thin Film Dielectric Solutions The General Plasma (GPI) linear PECVD technology is used to develop new thin film products and make existing products more economical. Linear PECVD technology offers an alternative to more expensive and slower reactive sputtering processes for depositing dielectric thin films. GPI’s ACIS (AC Ion Source) combined into an RPM (Reactive PECVD Module) provides a thin film PECVD Technology process that increases the throughput of dielectric thin films by a factor of 3 to 5 over competing sputtering technologies without sacrificing thin film quality. The advanced magnetic plasma design both enables uniformity across substrate widths that exceed 3 meters in length and provides thin film properties suitable for a multitude of large area applications. By utilizing inexpensive chemical precursors the RPM solution results in thin film materials and operating costs 4 to 10 times less than those deposited with sputtering technology. General Plasma’s PECVD technology has demonstrated applicability in display technology (cell phones, e-readers), solar cells (passivation of crystalline silicon cells and thin film TCOs), architectural glass, energy efficient lighting and roll-to roll web coating. The capability to deposit high and low index layers of clear dielectric films with excellent uniformity and thickness control opens the door to many important commercial applications.

General Plasma Inc. Tucson, AZ www.generalplasma.com Tel: 1-520-882-5100 E-mail: sales@generalplasma.com

PVD Coating Materials GfE Coating Materials, a subsidiary of AMG Advanced Metallurgical Group N.V., the Netherlands, is a manufacturer of PVD coating materials for architectural glass, web, solar, photovoltaic, optics, wear resistance, tribological and decorative applications. GfE is a worldwide leading manufacturers of sputter targets, arc cathodes and evaporation materials for the PVD Thin Film Technology. Our high quality customized products made of pure metals, alloys, oxides and cermets are used for a wide range of applications, such as in the manufacture of special functional layers for architectural and automobile glass or in photovoltaics with e.g. AZOY, titanium oxide or CIG material. GfE coating materials for wear resistance coatings, e.g. titanium aluminum, aluminum titanium, aluminum chromium or chromium significantly extend the tool life and the life time of components and thus lower the production costs and the environmental impact. The use of our products e.g. aluminum targets, chromium targets in the electronic industry allows for miniaturization and an improvement in efficiency. In optical applications PVD layer systems e.g. hafnium oxide, zirconium oxide or titanium oxide are used in the manufacture of e.g. laser mirrors, color filters, special filters and high quality layer systems in opthalmics. During production of GfE coating materials environmental concerns are absolutely met, being reflected in our outstanding environmentally friendly and energy-efficient production technologies and recycling programs for our products.

GfE Materials Technology Inc. Wayne, PA www.gfe.com Tel: 1-610-293-2504 E-mail: contact@gfe.com

High-Performance Sputtering Targets of Various Materials The Goodfellow Corporation has many high performance materials are available. A high-purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment. Goodfellow USA supplies a comprehensive range of metal and alloy sputtering targets. Goodfellow supplies metals, alloys, ceramics, polymers and other materials to meet the research, development and specialist production requirements of science and industry worldwide.

Goodfellow Corporation Coraopolis, PA www.goodfellowusa.com Tel: 1-800-821-2870 E-mail: info@goodfellowusa.com

Sputtering Targets for the Most Demanding Applications [Hereaus Vaccum coating technology graphic 20132.tiff] Heraeus Materials Technology, the materials and technology group of Heraeus Holding, provides high-tech industrial products from precious and platinum group metals as well as a comprehensive range of special metals. As a specialized division of Heraeus Materials Technology, the Target Materials Division represents more than 160 years of innovation and expertise in advanced materials technology. We are a recognized leader in the development and manufacture of high quality sputtering targets and evaporation materials for the large area coating, semiconductor, and electronics industries. Our versatile product development specialists work with you to meet even the most demanding production parameters in a wide range of sputtering target applications: architectural glass (low-e, solar control); automotive glass; anti-reflective/ antistatic coatings (ARAS); mirrors; photovoltaics; solar thermal; displays; electronic components & semiconductors; wear resistance; and magnetic data storage. The Heraeus core competence in precious metals enables us to offer a full package of precious metal products, supported by professional precious metal management and excellent customer service.

Heraeus Materials Technology North America, Target Materials Division Chandler, AZ www.heraeus-hmtna.com Tel: 1-480-961-9200 E-mail: info.hmtna@heraeus.com

300mm PVD Targets Honeywell Electronic Materials offers 300mm sputtering targets for the semi- conductor industry with various metals, configurations and purity. The 300mm sputtering targets offer consistent chemistry and purity combined with a sound, uniform microstructure. The advanced metallurgical design of the targets ensures optimum sputter performance and high yields. Our stateof- the-art diffusion bonding process offers superior custom 300mm targets with lightweight, high-strength backing plates that will ease handling and greatly reduce cost of ownership. Honeywell Electronic Materials is one of the world’s leading manufacturers of sputtering targets for the semiconductor industry.

ECAE Copper Manganese Sputtering Targets for Semiconductors Honeywell introduced new copper manganese (CuMn) sputtering targets for semiconductor manufacturing based on patented technology offering higher strength, longer life, and better performance. The new targets are based on Honeywell’s Equal Channel Angular Extrusion (ECAE) technology, an advanced manufacturing process Honeywell originally developed for Aluminum (Al) and Al alloys. Targets processed with ECAE technology have superfine grain size, which results in extremely homogeneous microstructure, high mechanical strength, and particle reduction. While grain size for standard targets can range from approximately 50 to 80 microns, the new ECAE CuMn targets exhibit sub-micron grain size. Fine grain structure produced by ECAE technology eliminates a plasma drop out issue that effected semiconductor manufacturers when using standard bonded targets. This issue caused arcing and particles, and necessitated scrapped wafers and target change-outs, which all contribute to unwanted higher costs. Increased strength allows for the entire target to be made from the same metal (monolithic). This essentially doubles overall life expectancies for the targets from the standard 1,800 kWh (kilowatt hours) to 3,600 kWh. Extended product lifetimes means producers can purchase fewer targets, spend less time and resources changing out the target and cleaning the chamber, and have more uptime for their production processes. All of this helps decrease total cost of ownership (CoO) for semiconductor manufacturers.

Honeywell Electronic Materials, part of Honeywell Performance Materials & Technologies Chandler, AZ www.electronicmaterials.com Contact: Lance Chapman Tel: 1-509-252-2102 or 1-480-293-9893 E-mail: lance.chapman@honeywell.com

High Purity Indium Indium Corporation is a leading global supplier of commercial and high purity indium metal. High purity indium is used as the starting material in the manufacturing of indium-based group III-V such as InP, InAs, InSb, InGaAs, and InGaAsP. These compound semiconductors find use in infrared detectors, LEDs, electronic switching applications, and photovoltaic solar cells. High purity indium is also used as the source material for semiconductor epitaxial layering using liquid phase, vapor phase, or molecular beam epitaxy. For more information, please contact us at compounds@ indium.com or www.indium.com/metals/indium.

Indium Corporation Clinton, NY www.indium.com Tel: 1-315-853-4900 or 1-800-4-INDIUM E-mail: askus@indium.com

Mark II Ion Source Gridless End-Hall Ion Sources for Thin Film Deposition The Intlvac Water-Cooled Mark II Ion Source adds efficient cooling for processes requiring low temperatures and reduced cycle times. Engineered and tested to withstand rigorous production environments, the Water-Cooled Mark II has a distinctive anode design that promotes excellent heat transfer out of the vacuum chamber and away from substrates. The gridless end-hall ion sources are used for ion assisted thin film deposition and substrate cleaning. Intlvac’s unique advantage is our in-house technology team and thin film lab. With a long history and broad experience as a high vacuum system designer and builder, Intlvac can provide you with prototype and production thin film coatings, or a deposition or etch system for your process. Our years of experience and knowledge are the key to your success.

Intlvac Thin Film Niagara Falls NY www.intlvac.com Tel: 1-716-284-0830 or 1-800-959-5517

High Quality Sputtering Targets and Evaporation Materials KAMIS offers high-quality sputtering targets, evaporation materials, crucible liners and other metals. For two decades, KAMIS has worked with the semiconductor industry, top research faculties and universities around the world. KAMIS has a wide variety of materials that are in stock. KAMIS can also manufacture materials to your unique and specific requirements. KAMIS also provides quality service. For a specific question or requirement on sputtering targets, evaporation materials, crucible liners, metal foil, sheet, plate, rod and wire, KAMIS’ technical staff has expert knowledge to help with your project.

KAMIS, Inc. Mahopac Falls, NY www.kamis.com Tel: 1-845-628-6173 E-mail: info@kamis.com

RFICP 360 Gridded Ion Beam Source Kaufman & Robinson introduces its newest RF gridded ion source: RFICP 360. Following our already popular RFICP product portfolio, the RFICP 360 is powered by an inductively coupled discharge and benefits from our dedicated arc handling design implemented in the KRI 1510 Ion Optics Controller. The RFICP 360 is the largest source in our portfolio and is intended to fulfill the market need for large area processing. Driven by market demand, the original configuration offers molybdenum, three grid, collimated ion optics for low energy processes. This ion optics design utilizes our well established and patented µ-dished technology. Future product plans include configurations optimized for mainstream ion/plasma beam processes such as ion beam assisted deposition and ion beam sputtering.

Kaufman & Robinson, Inc. Fort Collins, CO www.ionsources.com Contact: Chris Griffith Tel: 1-970-495-0187 E-mail: griffith@ionsources.com

Sputtering Targets KDF offers a large selection of high purity metals, alloys, non-metallic and cermets for virtually every sputtering and evaporation application in the industry. KDF’s facility is configured to manufacture production quantities of these materials, but it is also capable of small quantities for research applications at competitive prices. This manufacturing flexibility demonstrates KDF’s commitment to actively anticipating and meeting the needs of its customers. High purity sputtering targets are available in a variety of geometries, including planar, circular, conical, rectangular, ring, delta and custom configurations. KDF incorporates material processing techniques that include: vacuum induction melting; vacuum/inert hot pressing; hot/cold isostatic pressing; electron beam melting; and computer controlled machining. All KDF manufactured targets are shipped with a Certificate of Conformance, Material Purity Certificate and a MSDS (Material Safety Data Sheet) when required. Each target is chemically cleaned, marked and carefully packaged under vacuum or inert gas as required by the individual target.

Advanced Cathode Technology KDF has an active ongoing cathode development program encompassing theoretical simulation, mechanical design, empirical measurements and process testing on actual tools. All existing cathodes have been theoretically modeled using a sophisticated simulation package, as well as magnetically mapped and process- tested. New cathode designs will be available shortly which improve uniformity and target utilization. Since KDF’s purchase of MRC’s batch business in 1998 KDF has made many improvements to the original Inset design for high uniformity and high utilization of material. KDF has also created new Inset Cathodes that have increased sizes for the standard batch tools. The KDF 744 and 844 tools have Inset Cathodes up to 30.5 inches in length. The clamped material design can accommodate most metal and all precious metal types. KDF is the only Inline system manufacturer that designs their own cathodes for our complete product line, from the standard 5 by 15 to our enhanced 5 by 17 cathodes all the way to our 844 cathodes which are 5 by 30 inches. KDF does not depend on third party copycat designs, we produce some of the best cathodes in the world and we have the results to prove it. Process dependability comes from strong designs. The cathode is the critical part of your sputtering tool and therefore choosing the right one is also critical. KDF has a host of cathodes that are application dependent so that every specific requirement of an application can be met.

LMM Cathodes KDF has just released its newest version of the field proven LMM cathodes. This latest generation cathode now offers a lateral motion magnet pack that increases the overall utilization to approx. 60%. This recently engineered improvement allows for longer run times between target changes and aids in the decrease to target poisoning during long fully reactive runs. This new revision cathode will be Patent Pending as well, securing KDF position as a leader in cathode design technologies. By creating this new pivotal end turn around method, burn through at corners has been significantly reduced and thereby extending the usable target life for Full Face Erosion cathode.

KDF Electronic & Vacuum Services Inc. Rockleigh, NJ www.kdf.com Contact: Todd Plaisted, Director Sales & Marketing Tel: 1-201-784-5005 E-mail: todd@kdf.com or sales@kdf.com

Isoflux Inverted Cylindrical Magnetron Sputtering Sources KJLC is proud to offer Isoflux hollow cathode magnetron technology. With the capability of sputtering materials from all sides towards a substrate inside the cylinder, hollow cathodes are a proven and proprietary line of standard and customized magnetrons suited to coat complex 3-dimensional odd-shapes such as medical implants, machine tools, wires, fibers, and ribbons. Internal and external mount cathodes are available to fit to existing systems, and KJLC also offers a line of system platforms incorporating this technology. We provide sputtering solutions, installation, service, and training. More information is available at www.lesker.com.

Pulsed Filtered Cathodic Arc Source KJLC offers a Pulsed Filtered Cathodic Arc Source under license from Lawrence Berkeley Lab. In contrast to typical arc sources, the filtered arc source allows separation of macroparticles from the plasma. Cathodic arc sputtering condenses ions, which offers advantages over standard magnetron sputtering for some applications due to the generation of a plasma of sputtered material rather than neutrals created in standard sputtering. This technique also operates at lower pressures than traditional sputtering. We provide sputtering solutions, installation, service, and training. Visit www.lesker.com for more information.

TORUS Magnetron Sputtering Sources KJLC’s TORUS Magnetron Sputtering Sources have over 30 years of proven reliability and performance. With the capability of sputtering magnetic materials, insulators, semiconductors, and metals, our TORUS sputtering sources have a long history of success in thin film deposition. A wide variety of cathode styles are available to fit into virtually any application, including Circular R&D, Circular and Linear Production, and UHV Magnetrons. We provide sputtering solutions, installation, service, and training. Complete packages including power supplies are detailed at www.lesker.com.

Full Range of Sputtering Targets and Thermal Evaporation Supplies The Kurt J. Lesker Company offers a full range of sputtering targets and thermal evaporation supplies, many of which are stocked for immediate shipment. Our manufacturing capabilities include targets up to 16" diameter or linear lengths of up to 150". Lesker Materials also stocks a huge assortment of popular metals and inorganics for e-beam and thermal evaporation. Through ISO 9001:2000 Certification we are better able to serve our thermal evaporation and magnetron sputtering customers’ needs. Request a free copy of our Materials Deposition chart at www.lesker. com or give us a call to see how we can meet your sputtering or evaporation materials requirements.

Kurt J. Lesker Company Jefferson Hills, PA www.lesker.com Tel: 1-800-245-1656 or 1-412-387-9200 E-mail: salesus@lesker.com

Enhanced Sputtering Targets for Precious Metals MAT-VAC provides sputtering targets of various sizes and standards using the following materials: metals, metal alloys, oxides and nitrides. Our website has a comprehensive listing but the space available does not permit detailing all of the materials groups and systems/geometries which we support. Over the years we have built a reputation for filling special and exotic material requirements. If you have a special requirement, no matter how unusual, we would welcome the opportunity to review your specifications. We now have enhanced sputtering targets for precious metals. MAT-VAC has designed a series of enhanced geometry sputtering targets that greatly reduces the initial cost of ownership for precious metal (Au, Pt, Pd, Ir, Ag) sputtering target(s). Different sputtering target enhancements are available for DC/RF magnetron as well as RF diode sputtering modes for the majority of popular OEM (MRC, P-E, CVC, etc.) round and rectangular planar target assemblies. Custom enhancement designs are also available.

MAT-VAC Technology, Inc. Daytona Beach, FL www.mat-vac.com Tel: 1-888-998-9975 or 1-386-238-7017 E-mail: sales@mat-vac.com

SunSource GEN II High Utilization Linear Sputtering Sources The Materials Science, Inc. SunSource GEN II linear planar magnetron sputtering sources are available in 90mm/5”/6” wide targets and feature 40-45wt% utilization during the useful target life. They are rugged, easy to use and maintain. Available in target lengths up to 90", they are ideal for sputtering precious metals and expensive, hard to fabricate materials. These sources are a cost-effective alternative to rotary magnetrons in many large area coating applications Good target utilization and stable, repeatable operation can be achieved even at very low power levels in addition to very high rate/high power applications. An important benefit is that there is virtually no center material re-deposition. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. There are no “wiggles” down the length of the racetrack and no premature burn-through at the ends. The plasma discharge is confined to the region above the target surface due to the highly balanced magnetic design. No strong stray electromagnetic fields are generated that promote arcing, substrate damage and heating from electron and ion bombardment and sputtering of the source itself. Flange mount, internal mount and retrofit configurations are available with a variety of feedthrough and utility connection possibilities.

SunSource GEN II Round Magnetron Sputtering Sources Materials Science, Inc. SunSource round sputtering sources are available in internal and flange mount configurations with 4"to 8” diameter targets. Internal sources have a modular design - Tilt, Adjustable Height and Position, Shutter Mechanism and Mounting Flange/Feedthrough easily configured and later added to using industry standard fittings and components. It is user friendly and serviceable. Gas injection through the cathode body makes additional feedthroughs & manifolds unnecessary and allows low 10-4 Torr range operation. An active plasma discharge on nearly entire target surface significantly reduces insulating film growth and arcing and promotes stable operation. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. They can be used in DC, pulsed DC, AC and RF modes.

SunSource High Target Utilization Sputtering Sources Materials Science, Inc. SunSource round and rectangular sputtering sources feature the highest real target utilization of any planar magnetron available. Utilization varies from 40-45 wt% during the useful target life depending upon the target width and thickness. An active plasma discharge on nearly entire target surface significantly reduces insulating film growth and arcing and promotes stable operation. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. There is virtually no center re-deposition and the active plasma is confined to the target surface - target clamps and shields are not sputtered and consumed. There are no “wiggles” down the length of the racetrack and no premature burn-through at the ends of linear sources.

Materials Science, Inc. San Diego, CA www.msi-pse.com Tel: 1-858-483-3223 E-mail: jmiller@msi-pse.com

Sputtering Targets & Evaporation Materials for Large Area Coating Applications Recognized as a worldwide leader, Materion Advanced Materials Group is the go-to supplier for thin film coating materials. We offer an array of manufacturing processes to create custom-engineered material for large area coating solutions for the most demanding applications. Because we rigorously monitor our product quality and manufacturing processes, we have the capability and expertise to produce superior thin film materials for any size operation, from R&D to full-scale production. Our sputtering targets are customized for a broad range of materials and alloys, including Ag, Au, Pt, Sn, Ti, Zn, Zn Alloys, NiV, NiCR, stainless steel and specially developed ceramics used for applications from solar panels, LED products, architectural and automotive glass to specialty thin film coatings. We use both cylindrical sputtering targets and planar configurations to produce uniform coverage and assure consistent process performance. For more information, e-mail AdvancedMaterials@Materion.com

Inorganic Chemicals Catalog From aluminum to zirconium, Materion Advanced Materials Group’s online Inorganic Chemicals Catalog is the ultimate resource for over 1,500 high purity products. Searchable by chemical name, formula or CAS number, we make it simple to identify the materials you need. As Materion, we have integrated the former CERAC’s material offerings and capabilities with our own, benefiting customers with decades of our combined expertise in inorganic chemical synthesis. Whether you are seeking inorganic chemical sputtering targets, pellets or pieces; shaped cones or granules; or any other form, we have it! Our product offerings enable technology in a wide variety of markets including: fluorides, metallics, oxides, sulfides and selenides for optical coatings; phosphors and strontium nitride for LED; and CIGS materials for solar applications. Search our comprehensive resource and see how easy it is to meet your requirements. View Materion’s catalog at www.Materion.com/ AdvancedMaterialsGroup

Materion Advanced Materials Group Buffalo, NY www.materion.com Contact: Susan C. Doughtie, Multi Channel Marketing Communications Specialist Tel: 1-716-446-2307 or 1-800-327-1355 E-mail: AdvancedMaterials@Materion.com or Susan.Doughtie@materion.com

Thin Film Evap — e-Vap E-beam, Re-Vap Resistive & MAK Sputter Sources MeiVac Inc. has a complete line of thin film components including; e-beam, thermal and sputter sources. A full range of e-Vap sources from 2cc to over 400cc in HV and UHV are available. Flange mount and custom assemblies are also available. Mei- Vac e-Vap sources are the best solution for metals, oxides, dielectric and refractory materials. Re- Vap resistive evaporation sources have also been updated to assure they offer the best performance and price point in the industry. New digital front end power supplies make automation easy and most include GUI and publish API. A complete line of Industry leading electronics, accessories, sputtering sources, sample heaters and throttle valves are available.

MeiVac Inc. San Jose, CA www.meivac.com Contact: Jim Moore, e-Vap Product Manager Tel: 1-408-362-1000 E-mail: Jim.Moore@meivac.com

Platens NANO-MASTER manufactures platens for various RIE, PECVD, Ion Beam Milling and Etching applications. The platens are as large as 8” in diameter and depending on the application they are RF or DC biasable, water cooled, temperature controlled, rotating, height adjustable and tiltable. The platen temperatures can range from -80°C to 800°C. The NANO-MASTER designs are unique since they do not expose any wires or connections into the vacuum. Therefore, platens can be used in reactive environments and in wide range of pressures without arcs or shorts or added contaminants. Please contact Nano-Master for further information regarding your specific platen needs.

Plasma Sources NANO-MASTER manufactures ICP, Hollow Cathode, Microwave and Showerhead RF Planar Plasma Sources with circular geometry or with linear and scalable configurations and varying gas injection options for optimizing process uniformity or for matching gas dissociation or activation characteristics of the chemistry used. For example, RF showerhead plasma source can operate at as low as 20 W to as high as 600 W in 8" circular design. RF connection issues specifically deal with preventing ionization behind the showerhead gas distribution plate or occasional occurrence of higher density plasma around the small orifices or non-stationary modes of discharge. All these plasma sources are compatible with organo-metallic precursors and very high vacuum chambers.

Nano-Master, Inc. Austin, TX www.nanomaster.com Contact: Rosalba Andrade, Account Manager Tel: 1-512-385-4552 E-mail: r.andrade@nanomaster.com or main@nanomaster.com

Cones and Liners for Vacuum Deposition Neyco crucible liners protect the water-cooled copper hearth in electron beam units and eliminate the risk of contamination when one material replaces another in a given pocket. They also minimize heat transfer between the evaporated material and the water-cooled crucible. They reduce time of clean up and material changes and help increase deposition rates. Liners can be manufactured from graphite, molybdenum, tantalum and most other metals as well as from Al2O3, BN and other non-metals. The choice of the liners depends on the material to be evaporated.

Neyco Paris, France www.neyco.fr Contact: Valérie Rousseau Tel: 33 (0)1 40 53 07 53 E-mail: contact@neyco.fr or valerie.rousseau@neyco.fr

Ion Sources and Ion Guns The Nonsequitur Technologies (NTI) technological focus is directed toward developing and manufacturing High Performance Ion Optical Columns and Electron Guns/Emitters in addition to Surface Analysis Equipment. Currently we have installed ion sources and cathode assemblies throughout USA, Europe, and Japan. Our electron impact ion source can produce ions from a number of feed gases including hydrogen, helium neon, argon, xenon and nitrogen. With optionally available thoria coated iridium filaments Oxygen ions can be produced as well. These sources are available in a variety of geometries depending upon the required ion current and final focus size. By using an oven to evaporate material into the source region of an electron impact ion source ions may be produced of materials that are solid at room temperatures. Ions have been made from Tin and other materials. In addition C60 and other organic ions have been successfully produced. Source lifetimes of 10e4 nA hours are typical. By using an oven to evaporate material into the source region of an electron impact ion source ions may be produced of materials that are solid at room temperatures. Ions have been made from Tin and other materials. In addition C60 and other organic ions have been successfully produced. Source lifetimes of 10e4 to 10e5 nA hours are typical.

Nonsequitur Technologies Bend, OR www.nonsequitur-ion-gun.com Tel: 1-541-312-2410 Email: info@nonsequitur-tech.com

Sputtering Targets and Evaporation Materials Omat Sputtering Targets (Dong Guan) Co., Ltd produces sputtering targets and evaporation materials. It is part of the Omat Group with business divisions for targets, thermal spraying, super alloy, refractory metal, advanced ceramics, powder metallurgy, powders, etc. Omat performs the research and development and production of high-performance materials. OMAT produces sputtering targets for glass, PV, FPD and the hard coating industry. It has 600 employees, 10 years of production experience, and 3 manufacturing sites in China with 1.5 million square feet production space. Capacity: Plasma spray system 40 sets; rotary SiAl, TiOx, Cr, Si; cast rotary Sn, ZnAl, ZnSn, Zn- SnSb, In, SnCd; NiCr80/20, NiV7; planar and rotary Mo, W, Nb, Ta, Ti, Cr, TiAl, Zr, Cu, Si,; AZO, NbOx both rotary and planar.

Omat Sputtering Targets (DongGuan) Co., Ltd. Dongguan, Guangdong, China www.target.omat.com.cn/en/ Tel: 4000-012-1060

Sputtering Targets for Data Storage, Solar and Thermoelectric Applications Pioneer Materials, Inc. targets are characterized by their High Performance (HiP) attributes. Our target density (essential for keeping particle levels low) is second to none. Our materials consistency (essential for film uniformity) is among the highest in the industry. Optical media target materials include ZnS-SiO2, phase change alloys, photovoltaic materials and thermoelectric materials. PMI produces materials for optical recording media, thin-film photovoltaics and thermo-electric applications. Our Chengdu, China production facility performs key front-end and back-end process steps for manufacturing high performance materials used for optical media, thin-film photovoltaics, and thermo-electrics. The facility has an overall capacity of 1,000 targets a month for targets used across a wide spectrum of applications. The facility is 41,000 square feet and located in Chengdu’s West Hi-Tech Development Zone.

Pioneer Materials, Inc. Torrance, CA www.pioneer-materials.com Contact: Leon Chiu Tel: 1-714-721-5332 E-mail: leon.chiu@pioneer-materials.com

Target Materials for IBS Coatings Ion Beam Sputtering (IBS) has become a widely used method of Thin Film Deposition predominantly applied in the Optical Coatings field. IBS coating utilizes a High Energy ion beam directed at a target material, where ions transfer their momentum to the atoms of the target material causing them to dislodge and be deposited onto the substrate. The high energy of the ion beam produces high density, fine grained resultant films with excellent adhesion characteristics. Plasmaterials, Inc. has become specialists in providing the target materials used in IBS coatings. These materials include Tantalum, Niobium and Hafnium as well as Silicon. Due to strategic raw material partnerships, Plasmaterials, Inc. is able to provide extremely competitive pricing and a large inventory of these targets in various sizes, all this backed up by superior Technical Support in both material and process related areas.

Sputtering Targets for Research & Development Plasmaterials, Inc. offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication, including both Vacuum Casting and Powder Metallurgy processes. This range of fabrication techniques gives Plasmaterials, Inc. the ability to fabricate all of the common elemental materials, alloys and ceramic materials for a variety of applications. In addition, drawing on 27 years of practical Technical experience, Plasmaterials is able to provide a variety of innovative custom made materials based precisely on customer’s specifications.

Electron Beam Evaporation Materials Plasmaterials, Inc. has a broad array of materials for thermal evaporation of vacuum deposited thin films. These materials include elemental, alloy, composite, metallic, ceramic, cermet, refractory as well as “special” materials in a variety of purity levels. These materials are typically available in bulk forms ranging from pellets to graduals to cubes. Plasmaterials, Inc. offers thermal evaporation materials suitable for both resistance evaporation and electron beam deposition. When materials are heated in a vacuum, the thermal energy activates the atomic structure increasing the internal energy of the material. Once sufficient energy is high enough to break nearest neighbor atomic bonds, individual atoms or molecules are freed from the matrix host material. These particles develop a vapor stream of material that can be collected and condensed onto a suitably placed substrate thus producing a resultant film. A characteristic vapor pressure curve indicates the Vapor Pressure of a given material at a given temperature at a given pressure. Armed with this information, it is possible to design experimental and production runs for thin film deposition.

Plasmaterials, Inc. Livermore, CA www.plasmaterials.com Tel: 1-925-447-4030 E-mail: info@plasmaterials.com

Sputtering Targets on Cathode-Compatible Backing Tubes Process Materials, Inc. (PMI) is a global supplier and manufacturer of rotatable and planar sputtering targetsplanar sputtering targets, materials and services for solar and photovoltaic (PV) applications. Its rotatable sputtering targets on cathode-compatible backing tubes, planar (flat) targets are used for PV thin-film designs. Other target materials include zinc oxide (ZnO), alumina doped zinc oxide (ZnO+Al), molybdenum (Mo), titanium (Ti), chromium (Cr) and copper Indium (Cu) 80 (In) 20 wt%. Combine our expertise with the advanced rotatable cathodes developed by our sister company, Sputtering Components, Inc., and you have unique solutions for thin-film deposition and rotatable sputtering target applications. Process Materials, Inc. is a global supplier and manufacturer of sputtering targets, evaporation materials, backing plates, backing tubes, and bonding services for the thin- film deposition industry. The company develops planar and rotatable sputtering targets using materials such as AZO, ITO, CuIn, chromium, molybdenum, titanium, and silicon, among others.

Process Materials, Inc. Livermore, CA www.processmaterials.com Contact: Chris Combs, Senior Sales Account Manager Tel: 1-925-245-9626 E-mail: sales@processmaterials.com or c.combs@processmaterials.com

Sputtering and Evaporation Materials ProTech Materials Inc. has been a manufacturer and worldwide supplier of thin film materials for the solar, wear resistant coating, architectural glass, web coating and optical coating industries since 1997. The ProTech team’s experience in target manufacturing, physical vapor deposition (PVD) and PVD equipment manufacturing is positioned to offer customers integrated thin-film solutions. ProTech Materials has the capability to manufacture custom-engineered thin film materials on a small scale for concept and feasibility studies with the ability to rapidly ramp to production quantities when needed. ProTech provides a wide variety of sputtering targets, high purity evaporation materials, and indium products. Among the many materials offered, ProTech Materials has extensive experience in transparent conductive oxides (TCO), including indium tin oxide (ITO) and alumina doped zinc oxide (AZO). Additional services available include bonding, backing plates and backing tubes, as well as, target recycling.

ProTech Materials Inc. Hayward, CA www.protechmaterials.com Tel: 1-650-292-5435 E-mail: sales@protechmaterials.com

Evaporation Materials The R.D. Mathis Company offers a wide selection of high purity, vacuum ready evaporative materials. High purity evaporation materials in a variety of sizes, which include, gold, silver, nickel, aluminum, germanium, titanium, etc are available in small pellet sizes, slugs, wire, rod, sheet or plate. These and other materials are available in a variety of purities, sizes and quantities. We also offer hard to find materials as well as well as some alloys to meet your specific needs. We are continuing to expand our range of evaporation materials. If you do not see the material you are looking for, please contact our sales staff for availability and pricing. Visit our online store to view our wide selection of evaporation materials or call or e-mail us if you would like to discuss your specific coating and material needs.

Evaporation Sources THE RIGHT SOURCE catalog can help make your coating process a success. Since 1963, we have been fabricating and recommending sources for our customers. The R. D. Mathis Company is an ISO 9001:2008 and AS9100:2009C certified manufacturer of high vacuum evaporation sources and materials for thin film coating and metallizing industries. We support a wide array of industries including the optical and medical supplies industry. Products include tungsten, molybdenum and tantalum evaporation sources, tungsten filaments, tungsten baskets, crucibles, crucible heaters, evaporation boats, baffled box sources and alumina coated sources. We offer a wide variety of standard evaporation sources through our catalog and website, as well as modified and custom sources upon request. Our newest catalog has new products and materials to choose from and is available by calling our office, sending us an email or by visiting our website contact page. Detailed product info for all of our sources is available on our website as well. Call or email us if you would like to discuss your specific coating needs. Our technical assistance is always free.

The R.D. Mathis Company Signal Hill, CA www.rdmathis.com Tel: 1-562-426-7049 E-mail: info@rdmathis.com

Silver Targets Reliable Silver has been fabricating fine silver products including targets for industrial, decorative and investment purposes for more than 30 years. We offer a full range of products and services such as standard and customized silver products, testing and certification, and shipping insurance. Our fast turnaround times include next day delivery for stock products. We fabricate our line of silver products from 99.99% fine silver under controlled conditions to minimize or eliminate oxidation contamination and control impurities. Our silver products conform to customer standards and specifications.

Reliable Silver Corporation Naugatuck, CT www.reliablesilver.com Tel: 1-203.574.7732 E-mail: sales@reliablesilver.com

Targets and Backing Plates Rocky Brook Associates, Inc. produces, using either our material or yours, targets and backing plates (direct or internally cooled and custom) in Cu, Ti, Cr, Mo, Al to 99.999% pure. We specialize in copper but we work in many other materials. RBA was founded in 1973 by the Sawyer family as a distributor of copper and copper based alloys, stainless steel, precious and clad precious metals. The latter part of the 1970’s brought about many changes, including the beginnings of in-house production equipment. Today our production facilities include full CAD/CAM design, plate sawing, waterjet cutting, multiple CNC machining centers – capable of 100" (2540 mm) lengths – centerless grinding and deep hole drilling. We are committed to customer service. We have specialized in copper and it’s alloys for nearly 40 years. With our long history with copper, it was a natural move for us to begin supplying backing plates in the early 1990s. Since then we have expanded our range from small simple rectangular backing plates to more complex and much larger backing plates with features such as internal water channels, lengths up to 100"(2540mm), and more. We can provide standard backing plates to a variety of internationally known systems and we can quote your custom needs. Although we supply materials, some customers prefer to provide their own materials and this is fine. We can supply many targets in Cu up to 4N5+, Al up to 5Ns, Ti up to 4Ns, Cr up to 4Ns, Mo 3N5 and W 3N5.

Rocky Brook Associates, Inc. Narragansett, RI www.rockybrookinc.com Te: 1-401-789-0259 E-mail rockybrook@verizon.net

Sputtering Targets Production of sputtering targets, particularly those made out of precious metals, was launched at SAFINA, a.s. more than ten years ago. Technology has gradually been developed for silver sputtering targets used in the production of flat glass, targets for memory media, targets for production of decorative layers, targets for applying a surface finish to tools etc. Targets are also made using base metals such as Zn, Al, Cu and Ti as a standard. The products that we supply as a standard include monolithic targets, multi-piece targets, multi-piece targets mounted on fixing strips, tubular targets etc. One special service that we offer is the refilling of used targets, which saves costs to our customers. SAFINA, a.s. is a leading European supplier of planar and tubular targets used in the production of flat glass. The high homogeneity level of the materials supplied and the innovative technical solution comes as the result of continual development in this area aimed primarily at the effectiveness of using precious metals. Another important part of the service provided to the customer is recycling of used targets, metal reclaim. Our advanced deposition technology enables us to refill metal to used targets and thus to save reclaim costs, too. The manufacture of semi-conductors is the area of industry with the highest consumption of sputtering materials. Exceptional demands are placed on the purity and quality of the products supplied in this area. Analyses of the chemical composition and respecting the required impurity-content limits are both of great importance. Major demand is based on the types of materials used for sputtering – 4N platinum, gold and silver and 3N5 Pd.

SAFINA, a.s., a member of the SAFICHEM GROUPSAFINA Vestec, Czech Republic www.safina.cz Tel.: + 420 241 024 111 E-mail: info@safina.cz

Rotatable Molybdenum Sputtering Targets Saint-Gobain Coating Solutions offers a wide range of rotatable targets for architectural glass, PV, FPD and BIPV applications. Our proprietary technology allows us to produce targets up to 4 m in one piece (no joints) and without the need for an indium bonding layer. This allows the user to sputter at higher power and also use up to the last millimeter of material. All customized thickness profiles are easily attainable. Our proprietary technology also allows us to re-use backing tubes with minimal material waste. The Ceramic Materials division of Saint-Gobain produces thermal spray powders, EB-PVD ingots, Rokide ceramic spray systems and rods, thermal spray equipment for plasma spray, PTA high energy wires, powders, exclusive Flexicords, and Ekonol polyester powders for the PTFE filler markets. The Coating Solutions group combines these products offering expertise in material technologies and processes with several locations worldwide to serve your needs. The team’s ongoing research and development efforts result in new products and processing improvements that deliver greater productivity, higher yields and lower operating costs. Saint-Gobain Coating Solutions is a business of the Saint-Gobain Ceramic Materials division.

Saint-Gobain Ceramic Materials, Inc. Worcester, MA www.coatingsolutions.saint-gobain.com Tel: 1-800-535-5053 E-mail: CoatingSolutions@Saint-Gobain.com

Sputtering Targets, Evaporation Materials, Superconductors, Ceramic Powders SCI Engineered Materials is a global supplier of advanced materials for PVD Thin Film applications. Through partnerships with end users and original equipment manufacturers (OEM’s), SCI develops innovative and customized solutions enabling commercial success. We manufacture ceramic and metal sputtering targets in planar, rotary and custom configurations. SCI is a recognized leader in the development of Transparent Conductive Oxide (TCO) materials for various industries including optics, photonics, architectural glasses, solar photovoltaics, displays and solid-state thin film batteries. We are a full service supplier that includes target, backing plate or backing tube, plus indium bonding services. Please check our website under the following categories: sputtering targets, evaporation materials, superconductors, ceramic powders and substrates. SCI Engineered Materials works with the majority of our customers under Non-Disclosure Agreements (NDA).

SCI Engineered Materials, Inc. Columbus, OH www.sciengineeredmaterials.com Tel: 1-614-486-0261 E-mail: sales@sciengineeredmaterials.com

Sputtering Targets & Deposition Materials Extend your deposition system capabilities by selecting from the wide range of targets and materials available from Semicore Equipment. These include metals, alloys, superconducting alloys, borides, carbides, fluorides, nitrides, oxides, sel,enides, silicides, sulfides, tellurides, etc. We welcome inquiries for specialty materials. For details, availability and prompt quotations visit: www.semicore.com/ sputtering-targets or call 1-925-373-8201.

Compact Circular Magnetron Sputtering Systems Ideally suited for any new or retrofit application including complex cluster assemblies and the smallest vacuum chambers, this multi-versatile, Circular Magnetron Sputtering System from Semicore provides total power compatibility, lower pressure for maximized coverage and greater uniformity of deposition. Available in HV or UHV configurations, this high performance, power compatible system incorporates low-impedance heads to provide RF, DC, mid-frequency and pulsed DC’s as well as microwave compatibility. A Semicore patented threaded target clamp and anode shield permit easy target changes without use of special tools. As a consequence, built-in adjustability enables the use of targets having various thicknesses without resorting to spacing devices. For extremely low pressure, high power operation, the series SP400 Magnetron Sputtering System operates down to the 10-4 Torr range while our directly cooled designs deliver power densities up to 250 watts/in2 (30watts/cm2). With a number of systems available, these Magnetron Sputtering Systems are offered with 1 to 16 inches target diameters. Semicore uses ISO NW standard fittings, as well as Conflat metal seal flanges. All utilities are maintained at atmosphere and accessed through standard O-ring compression fittings for easy installation in any vacuum system. In addition, you can expect to substrate faster with greater uniformity, thanks to Semicore’s patented profiled magnets. Visit www.semicore.com for further details.

Achieve Extremely Broad Substrate Coatings Whether extremely broad substrate coatings are the projected use or significantly higher throughput is the goal, Semicore’s innovative Linear Magnetron Sputtering Systems will more than meet your requirements. The solution lies with fully encapsulated profiled NdFeB rare earth magnets and a turbulent water flow to produce unparalleled performance. Standard operation at extremely low pressure, along with exceptionally high power, combine to provide an ideal balance of uniformity with a throughput utilization rate for any application. These Semicore Liner Magnetron Sputtering Systems operate with fully compatible power through use of low impedance heads which provide RF, DC, Mid-frequency and pulsed DC’s plus Microwave power compatibility. Standard ISO NW fittings, as well as Conflat metal seal flanges are employed for structural durability. All utilities are maintained at atmosphere and accessed through standard O-rings compression fittings for easy installation in any vacuum system. Semicore Linear Cathodes utilized in this system are offered with a full range of 1.5" to 10" target widths and in lengths up to 8 feet. For further details visit www.semicore.com.

Semicore Equipment Inc. Livermore, CA www.semicore.com Contact: Matthew Hughes, President Tel: 1-925-373-8201 E-mail: hughes@semicore.com

High-Performance Cathodes Sierra Applied Sciences, Inc., is an industry leader in high-performance cathode technology. With our superior designs, customization and diverse cathode product lines, we can support and address any complex deposition application for all customers ranging from decorative to magnetic media. We also offer advanced customized designs for ITO applications that allow for lowest possible voltage operation and the highest conductivity films possible in the market today. These types of innovated designs, along with our patented magnetics allows our customers to achieve the highest target utilization possible with far superior quality films compared to our competition. We also offer the largest variety of cathode sizes, configurations, and mounting options for today’s complex applications. We at Sierra support our products with the highest level of quality and service our customers require. Once units are delivered, we’re there for all and any after market customer support for the life of our products. Close to 80% of our annual business is from repeat customers who only choose to buy from Sierra. Sierra’s pre-purchase performance and best price guarantee makes buying easy and risk free.

Sierra Applied Sciences, Inc. Boulder, CO www.sierraapplied.com Tel: 1-303-440-0861 E-mail: info@sierraapplied.com

Sputtering and Cathodic Arc Targets Many companies turn to Sophisticated Alloys for sputtering targets and cathodic arc targets because they consider us the “one-stop-shop” they trust to provide high purity materials that meet their exacting specifications. Because all of our alloys are made in house in one of our many vacuum induction systems, we can formulate the exact alloy you need for your physical deposition requirement. A full analytic capability ensures that your product will meet your composition and purity requirements. We offer a full range of post-melt processing and complete machining capability so we can deliver your cathodic arc or sputtering target in whatever shape you desire in whatever quantity you need whether that’s a one-off target or production quantities. For target assemblies requiring bonding we offer both indium and elastomeric bonds.

Sophisticated Alloys, Inc. Butler, PA www.alloys.com Tel: 1-724-789-0158 E-mail: info@alloys.com

CM-Series End Block External Mount Rotary Cathode Sputtering Components announced the release of their newest and smallest external mount rotary cathode - the CM-Series End Block. The CM-Series End Block, with an average weight of just 16 kg, is the most recent addition to the line of external mount cathodes. Just like the SM-Series and MM-Series end blocks, the CM features a customizable drive shaft length, external utilities, and a simple design; however, the CM can be used with two target sizes – a smaller, 80mm ID target, as well as the standard 125mm ID targets. The CM fills a gap in our current product offerings. It fits into a small chamber where planar cathodes had been the preferred choice. This will give the deposition industry and research facilities another option – one that offers better target utilization, increased uniformity, and lower annual maintenance cost. The compact design of the CM-Series End Block allows for flexibility and an increase to the number of cathodes that can be installed into a single system. This also creates an opportunity to switch between planars and external mounts in the same position. The CM will tolerate up to 20kW DC or 80 kHz MFAC, 1500v/50A and a target length of up to 1000mm. For more information about the CM-Series End Block or any of the other world-class SCI products, please contact Sputtering Components at sales@sputteringcomponents.com

Sputtering Components, Inc. Owatonna, MN www.sputteringcomponents.com Contact: Nancy Ness, Marketing Manager Tel: 1-507-455-9140 E-mail: sales@sputteringcomponents.com

Custom Magnetron Sputtering Sources SputterTek, LLC manufactures custom “high utilization” magnetron sputter sources for the thin film industry. Our round and linear sources employ our patented magnetron design for high target utilization and improved process performance. SputterTek develops custom mechanical and magnetic design solutions in close collaboration with our customers. We use the latest 3D modeling software and a well-established network of local suppliers to ensure optimum performance and the highest quality. Whether you are an OEM, want to upgrade your sputter coater, or just need a custom magnetron sputter source, if thin film sputter deposition is your daily business, learn about SputterTek for the latest magnetron technology. Our custom-designed sputter magnetrons offer you unprecedented benefits including improved target material usage and coater uptime, patented high-utilization magnet design, retrofit or custom planar configurations, and focus on the customer since 1998. They are available as magnetron only or an entire cathode assembly.

SputterTek, LLC Windsor, CA www.sputtertek.com Tel: 1-707-888-1781 E-mail: info@SputterTek.com

Sputtering Targets, Evaporation Materials and Crucible Inserts Since 1987, Super Conductor Materials, Inc. has manufactured sputtering targets, evaporation material, crucible inserts, e-beam gun replacement parts, ion implantor source replacement parts, and a variety of backing plates in its New York based facility. These high-tech, thin film materials and components have been successfully used in the production of semiconductors, solar panel materials, electronic instruments and optical instruments. SCM provides a complete CNC machine shop that allows them to offer various on-site services such as hot press, vacuum hot press, and vacuum melting services. Along with the reclaiming of many materials, SCM offers multiple bonding and refining services. Contact Super Conductor Materials at 1-845-368-0240 or sales@scm-inc.com for all thin film and sputtering system options.

Super Conductor Materials, Inc. Suffern, NY www.scm-inc.com Tel: 1-800-932-9333 or 1-845-368-0240 E-mail: sales@scm-inc.com

Specialty Sputtering Targets Symcon offers a wide variety of custom sputtering targets for advanced thin film applications including semiconductor, data storage, and optical films. Targets are available in configurations for all major PVD sputtering systems and in a wide range of materials, sizes and purities. Custom projects are our specialty. Symcon has been supplying high purity metals, alloys and compounds to industries such as semiconductors, thin-films, electronics, electro-optics and research establishments for over 30 years. Symcon offers an extensive selection of materials available in fabricated forms including sputtering targets, evaporation materials, powders, wire, rods and sheets.

Symcon-Process Technologies & Services, LLC Veldhoven, The Netherlands and Charlotte, NC www.processtechgroup.net Tel: 1-704-817-5950 E-mail: info@processtechgroup.com

E-Beam Sources Telemark offers the broadest range of rotatable multi-pocket HV sources, single pocket HV and UHV sources, and linear UHV electron beam sources. Options for arc-suppression, self-sealing cover plates, large inventory sources and crucibleless sources are available on specific models. These economical sources feature rugged, reliable construction, designed for ease of use and maintainability, and a plug-in emitter assembly for easy filament replacement. They are available with side or bottom crucible rotation, or an integral coaxial feedthrough. All components are maintained in stock, for quick, reliable delivery.

Ion Beam Sources Telemark offers an innovative new line of gridless ion sources and ion detectors for the thin film industry. These products were developed under the leadership of Dr. Wayne Sainty, who has over thirty years experience in thin film ion based physical vapor deposition processes. The Saintech sources run at low pressure (5 × 10-5 or lower) that affords an extended mean free path to the substrates. LPIAD, Low Pressure Ion Assisted Deposition has produced some of the finest metal oxide films with index values approaching “book values” at ambient temperatures. The use of high purity oxygen produces completely oxidized, densified and low stressed metal oxide films that will pass the strictest environmental testing. For metal fluoride films, the Saintech products use a patented “pulsing mode”. This mode assures densified fluoride compounds with no fluoride disassociation or oxy-fluoride production. The patented anode design offers high ion output and low maintenance. These sources can be used for pre-cleaning also. Pre-deposition bombardment of substrates with oxygen (where applicable) assures better film adhesion and enhanced growth sites. Saintech source users achieve excellent adhesion of Au and Ag without the use of binding layers. The Saintech ion source produces less substrate heating then traditional end hall or plasma sources and are an excellent choice for coating of plastics and other temperature sensitive materials. For more information about this new generation of ion sources, please contact Telemark.

Telemark Battle Ground, WA www.telemark.com Tel: 1-360-723-5360 E-mail: sales@telemark.com

Target Bonding] Thermal Conductive Bonding Inc. provides both elastomer and indium sputtering target bonding. TCB’s ongoing R&D programs enable the company to provide innovative, viable and economically attractive bonding solutions to a continually changing marketplace. We are also finding an ever-increasing number of applications requiring bonding solutions in today’s advanced product technology. Our bonding techniques continue to prove themselves highly adaptable and able to accommodate different and varied applications. Industries and markets where our proprietary techniques are applied currently include disk drives, semiconductors, solar energy, coated glass and flat panel technology. Sputtering is the preferred vacuum deposition technique used by manufacturers of semiconductors, CDs, disk drives, and optical devices. Sputtered films exhibit excellent uniformity, density, purity and adhesion. It is possible to produce alloys of precise composition with conventional sputtering, or oxides, nitrites and other compounds by reactive sputtering.

Thermal Conductive Bonding, Inc. San Jose, CA www.tcbonding.com Tel: 1-408-920-0255 E-mail: sales@tcbonding.com

Thin Film and Nanotechnology Sources Torr International, Inc. specializes in thin film and nanotechnology equipment. The current range of products include Standard Table Top low-priced Magnetron Sputtering systems for diverse applications, from specimen preparation for SEMs to R&D with metal, dielectric and polymer films to Custom-built multi-target sophisticated systems for special applications. We also manufacture thermal and E-beam evaporation systems to suit customers’ needs and specialize in etching systems with different configurations for corrosive and standard applications. We serve a worldwide market in the areas of thin film deposition and etching as well as high vacuum technology. We also supply all the materials and accessories needed for thin film deposition work.

Torr International, Inc. New Windsor, NY www.torr.com Tel: 1-845-565-4027 E-mail: torr@torr.com

High Purity Metals, Alloys and Targets for the Semiconductor Industry We are capable to support products for wafer sizes <150 mm through 450 mm. Tosoh SMD is able to provide many materials and custom alloys upon request. Tosoh SMD provides splat-free Aluminum target material through a combination of our advanced metallurgy, assembly technology, high-yield backing plates and nondestructive testing methods. Copper is used for a variety of thin film applications including as a conductor material in logic and memory devices. Tosoh offers Copper targets for all major OEM PVD systems. Targets for all wafer sizes can be made in purities ranging from 4N to 6N. Through control of the target metallurgy, surface finish and assembly technology, Tosoh offers Copper targets that light off easily and provide consistent and repeatable thin films with good particle performance. Tosoh’s advanced thermomechanical processing (ATMP) is used to tailor the target crystallographic texture and grain size for applications ranging from ultra-high performance to minimal-cost. Since leading PVD processes benefit from high power deposition, Tosoh developed and patented its room temperature FORTE bonded target. The unique and robust design ensures that consistent microstructure through the thickness of the sputtering target results in repeatable thin film performance without the risk of debonding.

Tosoh SMD Inc. Grove City, OH www.tosohsmd.com Contact: Phil Frausto, Director of Global Sales and Marketing Tel: 1-614-875-7912 E-mail: info.tsmd@tosoh.com or phil.frausto@tosoh.com

Sputtering Targets and Evaporation Materials ULVAC manufactures a complete line of sputtering targets and evaporation materials for semiconductors, display, recording material and optical film production. With today’s demand for sophisticated integrated circuits, our semiconductor materials must be of the highest purity. Unwanted alkali and transition metals, gases, and radioactive elements that corrupt such devices are reduced to minute levels. Material purity is confirmed by our own in-house analytical laboratory utilizing the advanced techniques including glow discharge mass spectrometry (GDMS), atomic emission spectroscopy (AES), and inductively coupled plasma mass spectrometry (ICP-MS). Large targets for Gen 8 substrates, made from the most difficult ceramic materials, is one of ULVAC’s strengths.

ULVAC Technologies, Inc. Methuen, MA www.ulvac.com Tel: 1-978-686-7550 E-mail: sales@us.ulvac.com

TCO (ITO) & Other Sputtering Targets for Glass Coating & Solar PV Applications Umicore is a leading manufacturer of TCO (ITO) & other material sputtering targets for Glass Coating and Solar PV applications. Umicore Thin Film Products (TFP), a globally active business unit within the Umicore Group, is a leading producers of coating materials for physical vapor deposition with more than 50 years experience in this field. Its semiconductors portfolio covers a wide range of highly effective sputtering targets and evaporation materials. TFP develops, manufactures, sells and recycles high quality coating materials for thin film applications in the advanced packaging, compounds, microsystems, and silicon front end segments. Due to our longstanding experience and strong cooperation with OC Oerlikon (formerly Unaxis and Balzers), our targets and evaporation materials are optimized for maximum performance in OC Oerlikon coating systems. As an industry leader, TFP also provides sputtering targets and evaporation materials to a wide selection of other coating systems. Target size and microstructure are designed to serve the latest sputtering equipment for 300 mm wafer technology.

Umicore Thin Film Products Providence, RI www.thinfilmproducts.umicore.com Tel: 1-401-456-0800 E-mail: sales.materials.pr@umicore.com

Anode Linear Layer Sources Veeco’s high power anode layer ion sources are scalable in either circular or linear geometries in excess of three meters and feature high current density operation from high vacuum up to milliTorr pressure ranges. The sources provide both gridless and filamentless operation with all inert and reactive gases. The sources’ low maintenance, independent beam energy and current control make them excellent for processes requiring long, uninterrupted production runs. Round and linear anode layer sources are ideal for a wide variety of applications, such as architectural/automotive glass, flat panel displays, web coating, ophthalmic, precision optics, data storage and semiconductor. Veeco offers the following Anode Layer Ion Sources: ALS340; ALS650; ALS1000; and ALS1500.

Gridded RF Ion Sources Veeco’s filamentless RF ion sources are low maintenance and ideal for processes using 100% argon, oxygen or other reactive gases. They come in either circular or linear geometries. RF sources produce broad, uniform, monoenergetic ion beams in both inert and oxidizing environments. An optional 4-grid design offers very high collimation. In addition, these sources have very long maintenance intervals, making them ideal for both batch and loadlocked production processes. Veeco offers RF ion sources in 3 cm RF, 6 cm RF, 12 cm RF and 16 cm RF.

Veeco Instruments Inc. Plainview, NY www.veeco.com Contact: Jeffrey Pina Tel: 1-516-677-0200 Ext. 1222 E-mail: jpina@veeco.com

Thin Film Coating Materials Founded in 1987 originally as a materials brokerage, Wonder Engineered Material Co., Inc. provides high purity metals to the market. We manufacture and stock thin film materials for semiconductor, compound semiconductor, wireless RF & microwave, precision optics/ laser, photovoltaic/solar, display technologies, data storage, MEMS, automotive, aerospace/ defense, and opthalmics applications. Our international growth followed the installation of the first target bonding and hot press operation in China. Now, Wonder Engineered Material provides JIT manufacturing and next day stocking distribution services to a growing worldwide client base. We are set up to quickly handle orders. Our experienced sales support team can help determine the best manufacturing methods to employ that will insure the best possible product for your application. Whether your requirement is large or small, you will receive the same excellent service. Our main products cover sputtering targets and evaporation materials including Ti, ITO, AZO, Nb2O5, SiO2,Mo and Cr with purity up to 99.999%.

Wonder Engineered Material Co., Ltd Xi’an,China www.wonder-materials.com Tel: + 86-29-85621927 E-mail: sales@wonder-targets.com

“Ultra Source” Multi-Hearth Electron Beam Source The new YTI “ULTRA SOURCE” retains all the advantages of the original Sloan E-Beam source, large hearth capacity, high deposition rates, long filament life, and industrial reliability, but has been re-engineered. There is no need to disconnect water fittings when disassembling the source for routine maintenance. All wear surfaces are now stainless steel instead of copper. Water leaks caused from removing the hearth have been eliminated. See http://ytionline.com/components/sources/ single-hearth-electron-beam-source/#

Single Hearth Electron Beam Source The YTI Single Hearth Electron Beam Source is a heavy-duty source offering large hearth capacity, high deposition rates, long filament life, and industrial reliability for R&D or production line applications. The source has one crucible that can accept a variety of liners. The source is designed to operate at input power levels up to 12 kW. The 270° bent beam design permits complete shielding of the filament from evaporated materials and falling debris. The source is also equipped with a water-cooled trap and permanent magnet for greater operating efficiency and safety. The electron beam can be swept in both the X- and Y-axis for optimum evaporation. See http://ytionline.com/components/sources/ single-hearth-electron-beam-source/#

Multi-Hearth Electron Beam Source The YTI Multi-Hearth Electron Beam Source is a heavy-duty source offering large hearth capacity, high deposition rates, long filament life, and industrial reliability for R&D or production line applications. The source has four crucibles that can be rotated into position either manually or automatically. The source is designed to operate at input power levels up to 12 kW. The 270° bent beam design permits complete shielding of the filament from evaporated material and falling debris and protects “line of sight” to the substrates. The source is also equipped with a water-cooled trap and permanent magnet for greater operating efficiency and safety. The electron beam can be swept in both the X- and Y-axis for optimum evaporation. See http://ytionline.com/components/ sources/single-hearth-electron-beam-source/#

YTI Ashford, CT www.YTIonline.com Tel: 1-860-429-1908 E-mail: sales@ytionline.com

©Cowan and Company, LLC. View All Articles.

Deposition and Evaporation Sources & Materials
https://bt.e-ditionsbyfry.com/article/Deposition+and+Evaporation+Sources+%26+Materials/2270426/272896/article.html